Automated diffractometer is designed for in-fab R&D and in-line production process monitoring of semiconductor materials. It enables fully automated characterization of many advanced materials in the semiconductor industry. MAX is the standard configuration, which comprises Scanning HRXRD, XRR, XRD, GI-XRD and WA-XRD for strain metrology, thin film and phase analysis on blanket wafers. Featuring fully automated source optics, the system can switch between standard XRD, High-Resolution, and X-ray reflectivity modes without user intervention, even within the same recipe batch. Full automation of the alignment, measurement, analysis and reporting of the results ensures productive and fast characterization of thin films.

8/6" wafer semi-auto multi-angle X-ray metrology